منابع مشابه
Young’s modulus of electroplated Ni thin film for MEMS applications
The Young’s modulus of an electroplated nickel (Ni) thin film suitable for microelectromechanical applications has been investigated as a function of process variables: the plating temperature and current density. It was found that the Young’s modulus is approximately 205 GPa at plating temperatures less than 60 jC, close to that of bulk Ni, but drastically drops to approximately 100 GPa at 80 ...
متن کاملNanostructurization of Fe-Ni Alloy
Data about an effect of cyclic γ-α-γ martensitic transformations on the structure state of reverted austenite Fe-31.7 wt.% Ni-0.06 wt.% C alloy are presented. The effect of multiple direct γ-α and reverse α-γ martensitic transformations on fragmentation of austenitic grains has been investigated by electron microscopy and X-ray diffraction methods. An ultrafine structure has been formed by nano...
متن کاملDental casting of superelastic Ni-Ti alloy.
Rods of Ni-43.5wt% Ti alloy were prepared under various casting conditions. Specimens which were melted in a cordierite crucible and cast in a phosphate-bonded investment mold had less strength and elongation than those melted in a copper crucible and cast in a phosphate-bonded investment mold. All castings exhibited superelasticity at room temperature. The upper limit of recoverable strain was...
متن کاملEffects of Process Conditions on Properties of Electroplated Ni Thin Films for Microsystem Applications
Effects of Process Conditions on Properties of Electroplated Ni Thin Films for Microsystem Applications J. K. Luo, M. Pritschow, A. J. Flewitt, S. M. Spearing,* N. A. Fleck, and W. I. Milne Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom Institute for Microelectronics Stuttgart, 70569 Stuttgart, Germany School of Engineering Science, University of Southampt...
متن کاملElectroplated Ni mask for plasma etching of submicron-sized features in LiNbO3
We here report on the fabrication of electroplated nickel (Ni) masks for dry etching of sub-micron patterns in lithium niobate (LiNbO3). This process allows obtaining a 350-nm thick Ni mask defining high air filling fraction holey arrays (e.g. openings of 1800 nm in diameter with inter-hole spacing of 300nm, or 330-nm diameter holes spaced by 440-nm). The mask profile is perfectly vertical (ang...
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ژورنال
عنوان ژورنال: Journal of the Surface Finishing Society of Japan
سال: 1989
ISSN: 0915-1869,1884-3409
DOI: 10.4139/sfj.40.444